| 摘要 |
Disclosed is an exposure apparatus for transferring a pattern formed on a mask to a substrate. The apparatus comprises: a support mechanism having three support legs, the three support legs being adapted to support the support mechanism at three points relative to an installation surface for the exposure apparatus. An illumination optical system is provided on the support mechanism to illuminate the mask having the pattern formed thereon. In the apparatus, as viewed in a vertical direction relative to the installation surface, the three support legs constitute three vertexes of a triangle and the illumination optical system is substantially symmetrical with respect to a straight line drawn from one vertex of the triangle toward the middle point in one side of the triangle opposite the one vertex.
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