| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask blank and a photomask suitable for processes (such as a resist coating method, an etching method and a cleaning method) in a large mask for an FDP (flat panel display). <P>SOLUTION: The mask blank for manufacturing an FPD device includes at least one of a light shielding film, and a semitransmitting film having a function of controlling the transmitted light quantity on a light transmitting substrate, wherein the light shielding film and the semitransmitting film show a square root average roughness Rq of 2.0 nm or less on the film surface. <P>COPYRIGHT: (C)2007,JPO&INPIT |
