| 摘要 |
An etching apparatus, an operating method thereof, and a method for manufacturing a display device using the same are provided to prevent reaction products from being attached to a lower electrode by strongly spraying gas between a substrate and the lower electrode, thereby preventing pollution of the lower electrode. On a base unit(111), a lower electrode(114) is fixed and supported. In the lower electrode, plural embossments(117) and plural injection holes(119) are formed. The injection holes are formed as penetrating the lower electrode so as to inject nitrogen gas on the lower electrode. Plural guides(125) horizontally move on the base unit, and fix an object located at a predetermined height from the electrode. A central area of a substrate(127) is supported by the nitrogen gas strongly sprayed through the injection hole of the lower electrode. |
