| 摘要 |
A substrate pre-alignment method, comprising: step 1: providing a substrate, wherein a plurality of marks are set on the surface of the substrate in a circumferential direction, and each of the plurality of marks is formed by at least one first line in a first direction and at least one second line in a second direction; step 2: aligning the centre of the substrate with a designated point of a substrate bearing platform; step 3: conducting light intensity irradiation on a selected mark of the plurality of marks on the surface of the substrate, and acquiring an image of the selected mark; step 4: processing the image, so as to obtain first projection data corresponding to the first direction and second projection data corresponding to the second direction; step 5: recognizing, from the first projection data, a group of first peak points of at least one first line corresponding to the selected mark, and recognizing, from the second projection data, a group of second peak points of at least one second line corresponding to the selected mark; step 6: selecting, from the group of first peak points and the group of second peak points recognized in step 5, first and second peak points which have the same number as the first and second lines and are credible and entering step 7, otherwise, selecting the next mark as a selected mark and returning to step 4; step 7: according to the first and second peak points selected in step 6, calculating the current location of the selected mark relative to the substrate bearing platform; and step 8: according to the current location of the selected mark relative to the substrate bearing calculated in step 7, the relative location of the selected mark on the substrate and an expected rotation angle of the substrate relative to the substrate bearing platform, rotating the substrate to the expected rotation angle. |
