Erzeugung von Mustern und Herstellungsverfahren für Halbleiteranordnungen mit diesem Muster

摘要

A process for forming an etching pattern, which comprises selectively irradiating a light to a clean surface of a material to be worked by etching so as to form radicals from a photoradical forming substance in an atmosphere of the substance, forming a modified portion having etching resistance at a photo-irradiated portion of the surface, and then subjecting a unmodified portion of the surface of the material to be worked to an etching treatment, thereby forming an etching pattern corresponding to a pattern formed by the irradiation.