| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a bipolar electrostatic chuck for holding a substrate and a substrate holding method by which a strong attractive holding force equivalent to the attracting force obtained when a direct current is applied can be stably obtained, even when an alternating voltage is applied, and remaining attracting force is reduced as much as possible when an applied voltage is stopped. SOLUTION: An electrostatic chuck is provided by providing a dielectric layer 5 which has a placing plane for a substrate to be held, on an electrode layer 3 which is formed on an insulating base 4 and consists of a first electrode part 1 and a second electrode part 2. The electrode layer 3 is composed of a comb-shaped electrode layer in which the first electrode part 1 and the second electrode part 2 are arranged alternately with intervals inbetween, and an alternating voltage of a frequency of 1-10 Hz is applied on the electrode.</p> |
