| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a sample stage for an aligner, which is capable of accurately aligning a pattern already constituted on a sample substrate to a mask pattern, by dividing the sample stage into a central part and peripheral parts that surround the central part, and by moving at least a part of the peripheral parts along radial direction of the sample stage in a state with the sample being chucked. SOLUTION: This sample stage is dividing into a sample-stage central part, sample-stage peripheral fixed parts, and sample-stage peripheral movable parts. A silicon substrate 21 is chucked on the sample-stage movable parts by driving vacuum chicks 16 of the sample-stage peripheral movable parts, while the operation of a vacuum chuck driver 24 of the sample-stage central part is stopped to suspend the chucking function of the vacuum chuck 14 of the sample-stage central part. While the silicon substrate 21 is being suction-held in this way only by the sample-stage peripheral movable part vacuum chuck 16, a motor 23 for the movement is made to move individual sample-stage peripheral movable parts radially toward outside along the radial directions.</p> |
