发明名称 METHOD FOR REDUCING THE CONTACT RESISTANCE IN ORGANIC FIELD-EFFECT TRANSISTORS BY APPLYING A REACTIVE INTERMEDIATE LAYER WHICH DOPES THE ORGANIC SEMICONDUCTOR LAYER REGION-SELECTIVELY IN THE CONTACT REGION
摘要 A semiconductor device is fabricated and contains a first body made of an organic semiconductor material and a second body made of an electrically conductive contact material, that form a common contact area. First, a body is produced on a substrate, which body may be composed of the contact material or the organic semiconductor material, and an intermediate layer is applied thereon, the intermediate layer containing a reactive dopant. Afterward, a body made of the organic semiconductor material or the contact material is fabricated on the intermediate layer. The dopant contained in the intermediate layer effects a region-selective doping of the organic semiconductor material and, as a consequence, a significant reduction of the contact resistance for the transition of charge carriers between the contact material and the organic semiconductor material.
申请公布号 US6806124(B2) 申请公布日期 2004.10.19
申请号 US20020285049 申请日期 2002.10.31
申请人 INFINEON TECHNOLOGIES AG 发明人 KLAUK HAGEN;SCHMID GUENTER;KRIEM TARIK
分类号 H01L21/00;H01L51/00;H01L51/10;H01L51/30;H01L51/40;(IPC1-7):H01L21/00 主分类号 H01L21/00
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