发明名称 ABRASIVE CLOTH AND POLISHING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an abrasive cloth which secures flatness of a polished object and improves polishing efficiency. <P>SOLUTION: An abrasive pad 1 has a polyurethane sheet 2 made of polyurethane resin. The polyurethane sheet 2 is formed with large cells 3 of approximately triangular cross section rounded along a thickness direction. The cell 3 has polyurethane resin existing in a partition wall shape, and micro foams 4 are formed in the polyurethane resin. Part of micro foams 4 is internally provided with micro particles 5 added in manufacturing the polyurethane sheet 2, and the micro particles 5 are detachable. Micro foams uniformly storing a polishing fluid containing abrasive particles are formed in a polishing surface P by eliminating the micro particles 5 positioned on the polishing surface P, by dummy polishing or the like. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004358584(A) 申请公布日期 2004.12.24
申请号 JP20030157526 申请日期 2003.06.03
申请人 FUJI SPINNING CO LTD 发明人 KUME TAKAHIRO;TAKEDA HIDENORI
分类号 B24B37/20;B24B37/24;B24D3/00;B24D3/32;B24D11/00;B32B5/18;H01L21/304 主分类号 B24B37/20
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