| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device manufacturing method, in which the precision of a manufacturing process used for forming a multi-level feature on a substrate, is improved. <P>SOLUTION: The device manufacturing method includes: providing a substrate on a substrate table having a different height relative to the substrate table by having a target region including a plurality of generally flat surfaces by each surface; determining the relative heights of each generally flat surface; projecting a patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with one surface of the generally flat surfaces; moving the substrate table in a direction substantially parallel to the axis of the beam; and projecting the patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with another surface of the generally flat surfaces. <P>COPYRIGHT: (C)2008,JPO&INPIT |
