发明名称 N-TYPE GROUP II-VI COMPOUND SEMICONDUCTOR FILM AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an n-type group II-VI compound semiconductor film enabling an increase in area, and also to provide its manufacturing method. SOLUTION: An n-type group II-VI compound semiconductor film manufacturing method includes a step of eliminating an F element from an F-element containing group II-VI compound semiconductor film by thermal treatment of the F-element containing group II-VI compound semiconductor film containing the F element. The group II element constituting the F-element containing group II-VI compound semiconductor film is Zn, and the group VI element constituting the F-element containing group II-VI compound semiconductor film is at least one kind selected from a group comprising Se and S. The F-element concentration in the F-element containing group II-VI compound semiconductor film is 5 to 20 atm%. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009059968(A) 申请公布日期 2009.03.19
申请号 JP20070227057 申请日期 2007.08.31
申请人 TDK CORP 发明人 AIDA YASUHIRO;USUDA MASATO
分类号 H01L21/20;H01L21/363 主分类号 H01L21/20
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