发明名称 INSPECTION APPARATUS AND INSPECTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a novel inspection apparatus for inspecting the surface roughness of an inspection object.SOLUTION: An inspection system 100 includes an electron source 101 generating an electron beam, a primary electron optical system 102 for introducing an electron beam generated from the electron source 101 to a sample S, an imaging device 104 for receiving mirror electrons generated from the sample by a detection surface and detecting the mirror electrons, a secondary electron optical system 105 for introducing the mirror electrons generated from the sample to the imaging surface of the imaging device 104, and an inspection processing unit 107 for determining the surface roughness of the sample by using the calibration information, based on the half width in a predetermined direction of the distribution of mirror electrons captured by the imaging device 104.SELECTED DRAWING: Figure 12
申请公布号 JP2016143651(A) 申请公布日期 2016.08.08
申请号 JP20150021318 申请日期 2015.02.05
申请人 EBARA CORP 发明人 HATAKEYAMA MASAKI;NAITO YOSHIHIKO;WATANABE KENJI
分类号 H01J37/29;G01B15/08;G01N23/225;G01N23/227;H01J37/20;H01J37/22;H01J37/28;H01L21/66 主分类号 H01J37/29
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