发明名称 METHOD FOR THE MANUFACTURE OF LIGHT EMITTING AND/OR PHOTODETECTIVE DIODES
摘要 <p>A method for the manufacture of light emitting and/or photodetective diodes, which comprises the following operations: a) providing a semiconductor MgxZnl-xTe substrate, b) treating the substrate to incorporate a doping element therein, c) applying a layer of conductive material to the substrate and treating the applied layer to create a compensated layer having high resistivity in the substrate, d) implanting ions on a first face of the compensated semiconductor substrate with sufficient energy to create two zones therein, a trapping zone in the semiconductor surface having a thickness less than the layer of high resistivity material, and in insulating zone above the trapping zone, e) forming conductive contacts on a second face of the substrate.</p>
申请公布号 CA1142250(A) 申请公布日期 1983.03.01
申请号 CA19790329413 申请日期 1979.06.07
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 BENSAHEL, DANIEL;MARINE, JEAN;SCHAUB, BERNARD
分类号 H01L31/10;H01L21/205;H01L31/032;H01L31/12;H01L33/00;H01L33/28;(IPC1-7):01L21/30 主分类号 H01L31/10
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