PRODUCTION OF THIN MAGNETIC ALLOY FILM

摘要

PURPOSE:To stably form a thin magnetic film having a uniform magnetostriction constant by using a specific composite target so that the compsn. of the thin magnetic film on a substrate can be controlled with high accuracy at the time of forming the thin magnetic film on the substrate by an RF magnetron sputtering method. CONSTITUTION:The target 1 provided with a magnet 7 for generating a magnetic field for focusing plasma on a rear surface and the substrate 4 for vapor deposition are disposed in a vacuum vessel 5 and after the inside of the vacuum vessel 5 is substd. with a dilute gaseous Ar atmosphere, gaseous Ar plasma is generated by impression of a high-frequency voltage, by which sputtering is generated on the surface of the target 1 and a target material is deposited on the substrate 4. The shortest distance of the inside measure of a main erosion area of the target 1 is set at the size larger than the diameter of the substrate 4 and a member 3 for controlling the compsn. is embedded in the central part thereof. The compsn. of the member 3 is made of the compsn. with which the magnetostriction is opposite from the magnetostriction with the compsn. of the target. The thin magnetic film made of the uniform compsn. having the target magnetostriction constant is thereby formed on the substrate 4.