CONTAMINATION PREVENTING METHOD FOR PLASMA VAPOR GROWTH APPARATUS,申请号JP19890003324-传众专利搜索

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发明名称	CONTAMINATION PREVENTING METHOD FOR PLASMA VAPOR GROWTH APPARATUS
摘要
申请公布号	JPH02183533(A)	申请公布日期	1990.07.18
申请号	JP19890003324	申请日期	1989.01.10
申请人	FUJITSU LTD	发明人	TSUKUNE ATSUHIRO;TOKI MASAHIKO
分类号	H01L21/205;H01L21/31	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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