| 摘要 |
PURPOSE:To form a resist pattern having small irregularity in size or shape of resist by detecting variation in conductivity of alkaline developer and determining a developing time when a predetermined circuit pattern is aligned on positive type photoresist and then alkaline-developed. CONSTITUTION:A substrate 1 is coated with positive type photoresist 2, a predetermined circuit pattern is aligned on the resist 2, and then alkaline-developed, variation in the conductivity of alkaline developer 3 is detected to determine a developing time. For example, the variation in the conductivity of the developer 3 during developing is measured as the change of a potential by electrodes 4, a voltmeter 5. As the electrodes 4, an electrode capable of measuring the potential of solution like a calomel electrode is employed. The change of the potential in this case depends upon the area of an exposed part 2a, a decrease of approx. several mV (when an applied voltage of a power source 6 is 1V) is observed, and its variation becomes as shown. A developing period of time is determined, for example, to time t2 by adding 10 sec to the time t1 in which the change of the potential is eliminated. |
