| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical mechanical polishing device and a method capable of preventing the formation of a mass of a polishing liquid between diamond particles of a dresser and capable of preventing shortening of the expected service life of the dresser by removing such a mass. SOLUTION: In a chemical mechanical polishing device 30 having a turntable 12 for holding a polishing pad 14 on an upper surface, a pressurizing head 16 for rotating/pressurizing a polishing object 18 by contacting the polishing object 18 held on an under surface with the polishing pad and a dresser 20 for polishing/refreshing an upper surface of the polishing pad by rotating/ pressurizing the under surface by contacting the under surface with the polishing pad and polishing the polishing object by pouring a polishing liquid into between the polishing object and the polishing pad, a dresser refreshing means 32 is arranged for refreshing the dresser by impressing an ultrasonic wave on this refreshing liquid from an ultrasonic vibrator 36 by soaking the dresser in the refreshing liquid W at unoperated time of the dresser. |
