发明名称 |
METHOD OF REMOVAL OF CONTAMINANTS FROM BASE SURFACE TREATED WITH RADIATION AND DEVICE FOR ITS EMBODIMENT |
摘要 |
FIELD: methods and devices for removal of contaminants from base surface to be treated with radiation. SUBSTANCE: method includes two stages: introduction of laminar flow of gas over treated surface, with gas neutral relative to treated surface; exposure to radiation of treated surface with high energy whose density and duration of effect being sufficient for removal contaminants from surfaces to be treated by insufficient for changing its crystalline structure. Said gas flow is maintained over treated surface of base under laminar conditions without formation of zones of back flow. Invention also covers device for embodiment of claimed method. EFFECT: high quality removal of contaminants from base surface without changing its molecular crystalline structure or some other disturbance of treated surface and without repeated precipitation of removed particles onto base surface. 29 cl, 43 dwg
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申请公布号 |
RU2136467(C1) |
申请公布日期 |
1999.09.10 |
申请号 |
RU19950119598 |
申请日期 |
1994.04.11 |
申请人 |
KOLDRON LIMITED PARTNERSHIP |
发明人 |
EHNGEL'SBERG ODREJ S. |
分类号 |
B23K26/36;B08B7/00;B23K26/00;B23K26/14;G03F7/20;H01L21/00;H01L21/304;H01L21/306;H01L21/3205;H01L21/321;H01L21/768;(IPC1-7):B23K26/00 |
主分类号 |
B23K26/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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