发明名称 METHOD OF REMOVAL OF CONTAMINANTS FROM BASE SURFACE TREATED WITH RADIATION AND DEVICE FOR ITS EMBODIMENT
摘要 FIELD: methods and devices for removal of contaminants from base surface to be treated with radiation. SUBSTANCE: method includes two stages: introduction of laminar flow of gas over treated surface, with gas neutral relative to treated surface; exposure to radiation of treated surface with high energy whose density and duration of effect being sufficient for removal contaminants from surfaces to be treated by insufficient for changing its crystalline structure. Said gas flow is maintained over treated surface of base under laminar conditions without formation of zones of back flow. Invention also covers device for embodiment of claimed method. EFFECT: high quality removal of contaminants from base surface without changing its molecular crystalline structure or some other disturbance of treated surface and without repeated precipitation of removed particles onto base surface. 29 cl, 43 dwg
申请公布号 RU2136467(C1) 申请公布日期 1999.09.10
申请号 RU19950119598 申请日期 1994.04.11
申请人 KOLDRON LIMITED PARTNERSHIP 发明人 EHNGEL'SBERG ODREJ S.
分类号 B23K26/36;B08B7/00;B23K26/00;B23K26/14;G03F7/20;H01L21/00;H01L21/304;H01L21/306;H01L21/3205;H01L21/321;H01L21/768;(IPC1-7):B23K26/00 主分类号 B23K26/36
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