| 摘要 |
<p>Damage to interconnect structures including vias and/or device interconnects through insulators having a low modulus of elasticity between materials having different coefficients of thermal expansion (CTEs) by providing bends or jogs in an interconnect which limit the axial length of the interconnect adjacent the via or device contact in accordance with the difference in CTEs. The interconnect thus limits the development of shear forces and serves to relieve them by flexure of the interconnect across portions of the narrow width of the interconnect; preventing concentration of shear forces near the via or device contact. Implementation as a design rule based on limitation of length of a straight segment of an interconnect trace is preferred.</p> |
