PHOTOSENSITIVE POLYMER COMPOSITION, METHOD FOR PRODUCING PATTERN, AND ELECTRONIC PARTS

摘要

PROBLEM TO BE SOLVED: To provide a positive type photosensitive polymer composition having high sensitivity, high resolution, a good pattern shape and a good rate of a residual film in the unexposed part, to provide a method for producing a pattern, and to provide electronic parts having high reliability. SOLUTION: The photosensitive polymer composition contains a polyimide or polybenzoxazole precursor having an o-quinone diazide skeleton in at least one end and represented by formula 1, 2 or 3. In the formulae 1-3, each R is H, COOH or COOR'; R' is a monovalent organic group; each R1 is a tetravalent organic group; each R2 is a divalent organic group which may have carboxyl or phenolic hydroxyl; (n) is an integer; each X is a monovalent organic group containing an o-quinone diazide skeleton or hydroxy; and each Y is a monovalent organic group containing an o-quinone diazide skeleton or H.