| 摘要 |
PROBLEM TO BE SOLVED: To provide an inline type film deposition apparatus where time and cost taken for designing and production are reduced, and to provide a unit to be used for the film deposition apparatus. SOLUTION: In the inline type film deposition apparatus comprising an outward run part 100, a return part 200, connection parts 1 and 10 connecting each toe and termination of the outward run part 100 and return part 200, and a plurality of treatment chambers 2a to 9a for film deposition arranged at the outward run part 100, the outward run part 100 is divided into sub-outward run parts 13a corresponding to the plurality of treatment chambers 2a to 9a, further, the return part 200 is divided into sub-return parts 13b corresponding to each sub-outward run part 13a, and mutually corresponding each treatment chamber 2a to 9a, the sub-outward run part 13a and the sub-return part 13b are integrated as units 2 to 9 for film deposition, thus the units 2 to 9 for film deposition are connected. COPYRIGHT: (C)2005,JPO&NCIPI
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