发明名称 Method for fabricating a self-aligned bipolar transistor having recessed spacers
摘要 According to one exemplary embodiment, a bipolar transistor comprises a base having a top surface. The bipolar transistor further comprises a first link spacer and a second link spacer situated on the top surface of the base. The bipolar transistor further comprises a sacrificial post situated between the first and second link spacers, where the first and second link spacers have a height that is substantially less than a height of the sacrificial post. The bipolar transistor also comprises a conformal layer situated over the sacrificial post and the first and second link spacers. According to this exemplary embodiment, the bipolar transistor further comprises a sacrificial planarizing layer situated over the conformal layer, the first and second link spacers, the sacrificial post, and the base. The sacrificial planarizing layer may comprise, for example, an organic material such as an organic BARC ("bottom anti-reflective coating").
申请公布号 US7033898(B1) 申请公布日期 2006.04.25
申请号 US20040865153 申请日期 2004.06.09
申请人 NEWPORT FAB, LLC 发明人 KALBURGE AMOL;YIN KEVIN Q.
分类号 H01L21/8222;H01L21/331 主分类号 H01L21/8222
代理机构 代理人
主权项
地址