| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a nanoparticle support device in which the particle carriers do not scatter to the outside from the inside of a vessel upon making nanoparticles for a catalyst carried on the particle carriers by the support device equipped with a source of coaxial type vacuum arc vapor deposition, and to provide a supporting method of nanoparticles. <P>SOLUTION: The supporting method of nanoparticles comprises controlling the charge-up of carbon black C by setting the capacity of a condenser unit 28 for arch discharge of the nanoparticle support device 1 to 4,400μF or less, setting the discharge potential of a direct current power source 27 for arch discharge to 100V or less and setting the discharge period to 2 Hz or more when platinum of a cathode electrode 22 is deposited and supported on the carbon black C of the particle carrier by means of arch discharge. Further, the charge-up of the carbon black C is controlled by discharging electrons from a thermoelectron emission device 41 installed in the vacuum chamber 11 of the support device 1. <P>COPYRIGHT: (C)2009,JPO&INPIT |
