发明名称 Methods and systems for fabricating semiconductor components with through wire interconnects (TWI)
摘要 A semiconductor component includes a semiconductor substrate having a substrate contact, and a through wire interconnect (TWI) bonded to the substrate contact. The through wire interconnect (TWI) includes a via through the substrate contact and the substrate, a wire in the via bonded to the substrate contact, and a contact on the wire. A stacked semiconductor component includes the semiconductor substrate, and a second semiconductor substrate stacked on the substrate and bonded to a through wire interconnect on the substrate. A method for fabricating a semiconductor component with a through wire interconnect includes the steps of providing a semiconductor substrate with a substrate contact, forming a via through the substrate contact and part way through the substrate, placing the wire in the via, bonding the wire to the substrate contact, and then thinning the substrate from a second side to expose a contact on the wire. A system for fabricating the semiconductor component includes a bonding capillary configured to place the wire in the via, and to form a bonded connection between the wire and the substrate contact.
申请公布号 US7579267(B2) 申请公布日期 2009.08.25
申请号 US20070712815 申请日期 2007.03.01
申请人 MICRON TECHNOLOGY, INC. 发明人 WOOD ALAN G.;HEMBREE DAVID R.
分类号 H01L23/48 主分类号 H01L23/48
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