发明名称 |
METHOD OF MANUFACTURING INTERMEDIATE MATERIAL OF ELECTRONIC ELEMENT, ELECTRONIC ELEMENT MANUFACTURING METHOD, INTERMEDIATE MATERIAL OF ELECTRONIC ELEMENT AND ELECTRONIC ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To suppress occurrence of unintentional inter-layer exfoliation in a manufacturing process.SOLUTION: A method of manufacturing an intermediate material of an electronic element contains a step of preparing a glass substrate 10, a step of forming an exfoliation preventing film 11 which is disposed on at least one surface of the glass substrate 10 and contains silicon at at least a part thereof, a step of forming a first polyimide film 12 which is disposed on the exfoliation preventing film 11 and contains fluorine at at least a part thereof, and a step of forming a second inorganic film 13 which is disposed on the first polyimide film 12 and contains silicon at at least a part thereof.SELECTED DRAWING: Figure 11 |
申请公布号 |
JP2016111010(A) |
申请公布日期 |
2016.06.20 |
申请号 |
JP20150228193 |
申请日期 |
2015.11.20 |
申请人 |
PANASONIC IP MANAGEMENT CORP |
发明人 |
ISAJI YUKA |
分类号 |
H05B33/10;B32B17/06;H01L51/50;H05B33/02;H05B33/04 |
主分类号 |
H05B33/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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