发明名称 POLISHING PAD
摘要 PROBLEM TO BE SOLVED: To provide a polishing pad with high versatility allowing the specification to be easily changed.SOLUTION: A polishing pad (1) is mounted on a disk-like base (40) connected to a rotary shaft (38) of a polishing device (2) for polishing a plate-like object (21). The polishing pad includes: a substrate member (3) mounted on the base of the polishing device; and a plurality of annular members (13) of different diameters which are respectively fixed to the substrate member and have respective polishing clothes (17) adhered to the opposite sides of the sides fixed to the substrate member. In the partial annular members, polishing clothes which are types different from the other partial annular members are adhered. The plurality of annular members are respectively and detachably fixed to the substrate member so that an inner peripheral surface (13a) of the outside annular member of two adjacent annular members is brought into contact with an outer peripheral surface (13b) of the inside annular member so as to concentrically dispose all the annular members.SELECTED DRAWING: Figure 1
申请公布号 JP2016159416(A) 申请公布日期 2016.09.05
申请号 JP20150043169 申请日期 2015.03.05
申请人 DISCO ABRASIVE SYST LTD 发明人 SUZUKI KEISUKE;WOO JUNSOO
分类号 B24B37/11;H01L21/304 主分类号 B24B37/11
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