发明名称 APPARATUS FOR VACUUM VAPOR DEPOSITION OF ALUMINUM
摘要 PURPOSE:To extend the service life of heater, by a method wherein the vacuum deposition within a fixed time is made possible by providing the procedure of its self-control of applied electric energy against the variation of resistance value of heater. CONSTITUTION:A vacuum deposition heater 6 is provided in a vacuum deposition tank 5, which is connected to a heater circuit via applied power source contacts 7 and 8. The heater 6 is applied with power by turning on a relay contact 21 when operated and power regulation is carried out with a variable resistance 16. Then, relay contact 22 is turned ON and the power for vacuum deposition is applied to the heater 6 according to the reset value of variable resistance 23. However, when the heater 6 is deteriorated, the vacuum deposition within a fixed time can not be carried out by the reset electric energy of variable resistance 23. Therefore, the power is increased against the increase of resistance value of heater 6 with the variable resistance 16 and the vacuum deposition within a fixed time is carried out.
申请公布号 JPS5983763(A) 申请公布日期 1984.05.15
申请号 JP19820193106 申请日期 1982.11.02
申请人 TOSHIBA KK 发明人 SHIMIZU YUKIO
分类号 H01J9/22;C23C14/24;C23C14/26 主分类号 H01J9/22
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