| 摘要 |
<p>This invention relates to an antistatic composition comprising an ammonium salt (a) represented by general formula (I), wherein one of R1, R2, and R3 is an alkyl group having 5 to 24 carbon atoms and the remainders are each an alkyl group having 1 to 5 carbonatoms, R4 is an alkylene group having 2 to 4 carbon atoms, n is an integer of 1 to 15, x is an anion of hydrochloric acid, chloric acid or perchloric acid, and a perchlorate (b) represented by the general formula M(ClO4)m, wherein M is an ion of a metal belonging to the groups 1A and 2A of the periodic table or an ammonium ion and m is 1 or 2; an antistatic composition comprising said ammonium salt (a), said perchlorate (b), and tri-2-ethylhexyl trimellitate (c); an antistatic chlorinated resin composition comprising said antistatic composition and a chlorinated containing resin; and a process for preparing the same.</p> |
