| 摘要 |
PURPOSE:To provide a transparent film having fine transparency and low resistance even though film thickness increases by laminating tin-added indium oxide transparent conductive films and transparent insulating films layer-like alternately in a film growth direction. CONSTITUTION:A tin-added indium oxide transparent conductive film (ITO film) 2 is formed in 1.000 angstrom thickness on a glass board 1. An In2O3 film 3 is formed in 1.000 angstrom thickness in the film thickness direction of the ITO film 2. On the board 1 the films 2 and the films 3 are laminated layer-like alternately in five layers so as to constitute complexly a transparent conductive film 4. Thereby, the films 2 having fine translucency and small electric resistance are layered via the films 3 so as to have a large cross section area, and can be used as a transparent electrode for large current. |
