发明名称 RETICLE FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 A reticle for fabricating a semiconductor device, wherein alignment-marks useful to examine a pattern mistake are formed upon a scribe line, the alignment-marks having pairs of adjoining primary and secondary measurement patterns. Each primary measurement pattern includes a rectangular pattern provided on a rectangular plate, and a rod-shaped pattern separately formed along the sides of the rectangular pattern. Each secondary measure pattern is fitted into the rectangular pattern of the respective primary measure pattern in case that the secondary measure pattern is overlapped with the primary measure pattern, to thereby permit the examination of position of the secondary measurement pattern relative to the primary measurement pattern.
申请公布号 KR0156422(B1) 申请公布日期 1999.02.01
申请号 KR19950034169 申请日期 1995.10.05
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JUNG, SUNG-KIL;SONG, MOON-KOOK;KIM, JUNG-RYUL;KIM, JUNG-HEE
分类号 G03F9/00;G03F7/20;H01L21/027 主分类号 G03F9/00
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