THROUGHPUT ENHANCEMENT FOR SINGLE WAFER REACTOR

摘要

A semiconducteur substrate processing system, including a single wafer react or and a multi-wafer holder (30) positionable in the reactor. The system also optionally includes an automated substrate transport assembly (144) includin g a multi-wand array for transporting a corresponding plurality of wafers into and out of the reactor, and a multi-wafer cassette (100) for simultaneously supplying multiple wafers to the multi-wand array. The multi-wafer modifications permit ready upgradeability to an existing single wafer reacto r and markedly enhance the throughput capacity of the reactor while retaining the film uniformity and deposition process control advantages of the single wafer reactor system.