| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemically amplifying positive or negative radiation sensitive composition capable of stably forming a fine pattern excellent in machining performance in a small space, critical dimension uniformity, maintainability and stability as a resist, having small density dependence in high accuracy. SOLUTION: The positive type radiation sensitive component contains (A1) a copolymer including a hydroxy(methyl) styrene unit and/or an alkoxy(methyl) styrene unit and a repeating unit expressed in formula (3) and (B) a radiation sensitive acid generator. The negative type radiation sensitive component contains (A2) a copolymer including a hydroxy(methyl) styrene unit and a repeating unit expressed in the formula (3), (B) the radiation sensitive acid generator and (C) a compound capable of bridging the component of (A2) under the existence of an acid. |
