POLISHING TOOL, POLISHING DEVICE AND POLISHING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a polishing tool, a polishing device and a polishing method for uniform polishing work with a polishing pad even if the polishing pad has a poor plane. SOLUTION: When the polishing device containing a polishing tool having a polishing pad 3 held on one face of a thin material 1 extending in the form of one plane is used to polish a machined face of a work 4 held on a work holder 5, the polishing method is adopted in which (A) a guide link 7 is mounted on the work holder 5 so that its polishing plane is flat with the machined face of the work, (B) the machined face of the work 4 and the polishing plane of the guide link 7 are pushed against the polishing pad 3 with a fluid having the same pressure, and (C) the polishing pad 3 is moved relative to the work 4. If required, a portion 3a of the polishing pad 3 is pushed against the machined face of the work 4 using the pressure of the fluid in polishing work.