发明名称 Method and apparatus for inspecting defects
摘要 In a method for inspecting a defect in accordance with one aspect of the present invention, an object is divided into a plurality of regions. Reflectivity of each of the plurality of regions is obtained. Amplification ratio for each region is determined using the reflectivity. A light is irradiated onto the regions. A light reflected from a first region is amplified by a first amplification ratio that is determined for the first region. Moving the irradiated light from the first region to a second region is detected. A light reflected from the second region is amplified by a second amplification ratio that is determined for the second region. The amplified lights from the first region and the second region are analyzed to determine an existence of a defect on the object.
申请公布号 US7271890(B2) 申请公布日期 2007.09.18
申请号 US20040903852 申请日期 2004.07.30
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM JOUNG-SOO;YANG YU-SIN;KIM MOON-KYUNG;CHON SANG-MUN;CHOI SUN-YONG;JUN CHUNG-SAM
分类号 G01N21/00;G01N21/55;G01N21/95;H01L21/66 主分类号 G01N21/00
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