| 摘要 |
PURPOSE: Provided is a system for compensating the positional and angular fluctuations in light generated by a laser for especially micro-lithographic illumination device, causing adverse effects on the uniformity of light distribution and the characteristic of centroidal beam angle as much as possible. CONSTITUTION: A system for at least the large range of the compensation of the directional and positional fluctuations of a light beam(2) generated by the laser(1), especially for the micro-lithographic illumination device, is provided with a beam splitter(4) arranged at the inside of the laser beam(2) and at least two beam-deflecting devices(6) and(7). A partial beam(2a) is directly guided to the illumination reference surface(3) of the illuminating device thereof by the beam splitter(4), while the other partial beam(2b) is returned to the beam splitter(4) via a bypass(5) at which at least two beam deflecting devices(6) and(7) are arranged, and next it is led similarly to the illumination reference surface(3).
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