发明名称 |
CHEMICAL AMPLIFICATION TYPE POSITIVE TYPE RESIST COMPOSITION |
摘要 |
PURPOSE: To provide a chemical amplification type positive type resist composition having various good resist performances such as sensitivity, resolution and adhesiveness to a substrate and excellent in wettability particularly with an alkali developing solution. CONSTITUTION: The resist composition contains a resin based on an alkali- insoluble or slightly alkali-soluble polymer which is made alkali-soluble by the action of an acid and has a polymerized unit of a dihydroxy-1-adamantyl (meth)acrylate of formula I and a polymerized unit having an acid labile group, e.g. a polymerized unit of a 2-alkyl-2-adamantyl(meth)acrylate of formula II and an acid generating agent. In the formulae I and II, R1 and R2 are each H or methyl; and R3 is alkyl.
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申请公布号 |
KR20010062537(A) |
申请公布日期 |
2001.07.07 |
申请号 |
KR20000079000 |
申请日期 |
2000.12.20 |
申请人 |
SUMITOMO CHEMICAL CO., LTD. |
发明人 |
FUJISHIMA HIROAKI;TAKADA YOSHIYUKI;UETANI YASUNORI |
分类号 |
H01L21/027;G03F7/004;G03F7/039;(IPC1-7):G03F7/039 |
主分类号 |
H01L21/027 |
代理机构 |
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主权项 |
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地址 |
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