发明名称 METHOD FOR PRODUCING SEMICONDUCTOR WAFER DOPED WITH NITROGEN
摘要 PURPOSE: A method for producing a semiconductor wafer doped with nitrogen is provided to uniformly contain NH3 gas contained in a single crystal. CONSTITUTION: The method includes a process of pulling up single crystal from molten liquid of a semiconductor material while supplying a doping material gas to the semiconductor material and a process of separating the semiconductor wafer doped with nitrogen from the pulled-up single crystal. The doping material gas is supplied to the semiconductor material until pulling-up of a part of the single crystal is started, and the semiconductor wafer is separated from the single crystal.
申请公布号 KR20010061924(A) 申请公布日期 2001.07.07
申请号 KR20000051533 申请日期 2000.09.01
申请人 WACKER SILTRONIC GESELLSCHAFT FUR HALBLEITERMATERIALIEN AG 发明人 FREY CHRISTOPH;VON AMMON WILFRIED;WEIDNER HERBERT;ZEMKE DIRK
分类号 H01L21/208;C30B13/00;C30B13/10;C30B15/00;C30B15/04;(IPC1-7):H01L21/208 主分类号 H01L21/208
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