发明名称 |
METHOD FOR PRODUCING SEMICONDUCTOR WAFER DOPED WITH NITROGEN |
摘要 |
PURPOSE: A method for producing a semiconductor wafer doped with nitrogen is provided to uniformly contain NH3 gas contained in a single crystal. CONSTITUTION: The method includes a process of pulling up single crystal from molten liquid of a semiconductor material while supplying a doping material gas to the semiconductor material and a process of separating the semiconductor wafer doped with nitrogen from the pulled-up single crystal. The doping material gas is supplied to the semiconductor material until pulling-up of a part of the single crystal is started, and the semiconductor wafer is separated from the single crystal.
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申请公布号 |
KR20010061924(A) |
申请公布日期 |
2001.07.07 |
申请号 |
KR20000051533 |
申请日期 |
2000.09.01 |
申请人 |
WACKER SILTRONIC GESELLSCHAFT FUR HALBLEITERMATERIALIEN AG |
发明人 |
FREY CHRISTOPH;VON AMMON WILFRIED;WEIDNER HERBERT;ZEMKE DIRK |
分类号 |
H01L21/208;C30B13/00;C30B13/10;C30B15/00;C30B15/04;(IPC1-7):H01L21/208 |
主分类号 |
H01L21/208 |
代理机构 |
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地址 |
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