发明名称 Semiconductor device having conductive bumps and fabrication method thereof
摘要 A semiconductor device having conductive bumps and a fabrication method thereof are provided. The fabrication method mainly including steps of: providing a semiconductor substrate having a solder pad and a passivation layer formed thereon with a portion of the solder pads exposed from the passivation layer; disposing a first metal layer on the solder pad and a portion of the passivation layer around the solder pad; disposing a covering layer on the first metal layer and the passivation layer, and forming an aperture in the covering layer to expose a portion of the first metal layer, wherein a center of the aperture is deviated from that of the solder pad; deposing a metal pillar on the portion of the first metal layer; and deposing a solder material on an outer surface of the metal pillar for providing a better buffering effect.
申请公布号 US2008169562(A1) 申请公布日期 2008.07.17
申请号 US20070005764 申请日期 2007.12.27
申请人 SILICONWARE PRECISION INDUSTRIES CO., LTD. 发明人 KE CHUN-CHI;HUANG CHIEN-PING
分类号 H01L23/52;H01L21/44 主分类号 H01L23/52
代理机构 代理人
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