WAFER HOLDING ROBOT END EFFECTER VERTICAL POSITION DETERMINATION IN ION IMPLANTER SYSTEM
摘要
<p>A wafer handling robot, ion implanter system including a wafer handling robot and a related method are disclosed. An ion implanter system may include an ion implanting station including a load lock coupled thereto; a wafer handling robot located at least partially within the load lock, the wafer handling robot including an end effecter for handling at least one wafer, and a motor for moving the end effecter vertically; and a sensor positioned within the load lock to determine a vertical position of the end effecter.</p>
申请公布号
WO2008109426(A1)
申请公布日期
2008.09.12
申请号
WO2008US55476
申请日期
2008.02.29
申请人
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.;BLINNS, BRANT, S.;DANIELS, KEVIN;POITRAS, ROBERT, A.
发明人
BLINNS, BRANT, S.;DANIELS, KEVIN;POITRAS, ROBERT, A.