| 摘要 |
The present invention relates to an apparatus for treating a substrate. According to an embodiment, the apparatus for treating a substrate includes a housing, a substrate supporting unit, a solution supplying unit, etc. The solution supplying unit includes a nozzle, a container, and a solution supplying tube. A hydrophobic surface is formed on a part or the entire part of an outer surface of the nozzle. The hydrophobic surface can be supplied in a net layer structure, a structure to be arranged in a fine protrusion part, or a superomniphobic structure. |
