发明名称 |
POLISHING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a polishing device whose running cost is reduced by utilizing a polishing pad effectively. SOLUTION: A grooving device 2 is provided on the base body 105 (polishing device body) of a polishing device 1, and a polishing pa 3 having thickness of 5 mm or more is used. First and second pedestals 4 and 5 are fixed at positions holding a platen 103 therebetween on the upper face of the base body 105, and the grooving device 2 is mounted on the first and second pedestals 4 and 5 detachably therefrom. A cutter 6 which is a cutting edge as a grooving device 2 and a slide way 7 (cutting edge moving device) are provided by moving the cutter 6 on the straight line passing though the rotation center C of a platen 103 driven rotatably to form a closed curve like or spiral groove. The thickness t of the polishing pad 3 is 15 mm. |
申请公布号 |
JP2001198795(A) |
申请公布日期 |
2001.07.24 |
申请号 |
JP20000004058 |
申请日期 |
2000.01.12 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
KOBAYASHI TATSUNOBU;TANAKA HIROSHI;OGATA YASUYUKI |
分类号 |
B24B37/00;B24B37/20;B24B37/26 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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