AMORPHOUS SILICON PHOTOSENSITIVE BODY

摘要

PURPOSE:To improve the moisture resistance of an amorphous silicon photosensitive body and to considerably prolong the service life by specifying the maximum height of the surface roughness of the photosensitive body. CONSTITUTION:An amorphous silicon photoconductive layer is formed on the surface of a support to obtain an amorphous silicon photosensitive body. At this time, the photoconductive layer is formed so that the maximum height of the surface roughness of the layer is restricted to <=300Angstrom . By the restriction, the surface area is reduced, so the exposed defects are reduced and the moisture resistance is extremely improved. The miximum height is preferably restricted to <=100Angstrom so as to provide high resolution and durability. In case of <=50Angstrom maximum height, the removal of a toner is facilitated and the printing resistance of the photosensitive body can be extremely improved.