| 摘要 |
<p>PURPOSE:To restrain generation of dust and improve yield as compared with the conventional technique. CONSTITUTION:An aperture 22 is formed in a mounting part 21 on which a wafer carrier 9 is mounted, and a roller 23 for rotating a wafer is installed under the aperture 22. Both ends of the roller 23 are retained by a roller retaining member 24, and a motor 25 for driving a roller is installed. Below the above mechanism, an elevating mechanism 27 which moves, en bloc, the roller 23 for roating a wafer, the motor 25 for driving a roller, etc., up and down. The elevating mechanism 27 is constituted so as to be driven by a step motor, and driven by a command from a control equipment 28 constituted of a CPU and the like.</p> |
