CLEANING METHOD FOR REACTION CHAMBER OF SILICON BASED THIN FILM FORMING EQUIPMENT,申请号JP19930197203-传众专利搜索

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发明名称	CLEANING METHOD FOR REACTION CHAMBER OF SILICON BASED THIN FILM FORMING EQUIPMENT
摘要
申请公布号	JPH0750266(A)	申请公布日期	1995.02.21
申请号	JP19930197203	申请日期	1993.08.09
申请人	TOSHIBA CORP	发明人	MATSUMURA KUNIO
分类号	H01L21/205;H01L21/304;(IPC1-7):H01L21/205	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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