| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing photomask and a photomask drawing system by which process time for a photomask can be decreased and the cost can be reduced while the accuracy required for various patterns to be formed on the photomask is maintained. <P>SOLUTION: First and second drawing data 7, 8a, 8b are formed by figure operation of design data. A first pattern is formed in a first region on the photomask according to the first drawing data 7 by using a first photomask drawing apparatus. The a second pattern is formed in a second region on the photomask according to the second drawing data 8a, 8b by using a second photomask drawing apparatus having the processing accuracy different from the processing accuracy of the first photomask drawing apparatus. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
