发明名称 SITE-SELECTIVELY MODIFIED MICROSTRUCTURE BODY AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a method capable of selectively facilitating physical and chemical modification on specific sites only of recessed parts or protruded parts among structures having ruggedness manufactured by a nano-imprint technology. SOLUTION: An original board having a ruggedness is pressed against a polymer substrate composed of two layers having at least chemical compositions different from each other and, thereby, a second layer from the surface which is hidden by the uppermost surface layer heretofore is visualized as a cross-section of a pillar part. The site-specific chemical modification of a pillar can be performed by forming the second layer with a chemically desirable composition or by chemically modifying a cross-section of the second layer after formation of the pillar. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007219033(A) 申请公布日期 2007.08.30
申请号 JP20060037362 申请日期 2006.02.15
申请人 HITACHI LTD 发明人 MURAO KENJI;KUWABARA KOSUKE;OGINO MASAHIKO
分类号 G02B1/02;G02B1/04 主分类号 G02B1/02
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