| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of etching a layer on a substrate including at least one etching cycle.SOLUTION: In a method for etching a layer on a substrate including at least one etching cycle, the etching cycle includes a step for providing inert gas continuously to a reaction space, a step for providing a pulse of etching gas to a continuous inert gas flow in the upstream of the reaction space, and chemically adsorbing the etching gas, in non-excited state, to the surface of a substrate in the reaction space, and a step for etching a layer on the substrate by providing a pulse of RF power discharge between the electrodes, in order to generate reaction species in the reaction space.SELECTED DRAWING: Figure 1 |
