INTEGRATED CIRCUIT DESIGN METHOD

摘要

A method for designing an integrated circuit (IC) comprises the steps of: receiving a first layout including a first pattern; receiving a second layout including a second pattern, wherein the second layout is that the first pattern is separated from the second pattern when the first layout and the second layout overlap; providing a cut pattern between the first pattern and the second pattern, and overlapping the first pattern when the first layout, the second layout and the cut pattern overlap; and providing a jog extending from the cut pattern to further overlap the first pattern with a length when a spacing between the second pattern and an edge of the cut pattern overlapping the first pattern is lower than a predetermined value. A ratio of the length of the jog to the spacing between the second pattern and the edge of the cut pattern overlapping the first pattern is in a range of 1/5 to 1/1.