| 发明名称 |
FRONT REFERENCED ANODE |
| 摘要 |
Apparatus and methods for electroplating are described. Apparatus described herein include anode supports including positioning mechanisms that maintain a consistent distance between the surface of the wafer and the surface of a consumable anode during plating. Greater uniformity control is achieved. |
| 申请公布号 |
US2016222541(A1) |
申请公布日期 |
2016.08.04 |
| 申请号 |
US201615093435 |
申请日期 |
2016.04.07 |
| 申请人 |
Novellus Systems, Inc. |
发明人 |
Feng Jingbin;Stowell R. Marshall;Ghongadi Shantinath;He Zhian;Wilmot Frederick Dean |
| 分类号 |
C25D21/12;H01L21/288;C25D7/12 |
主分类号 |
C25D21/12 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
Fremont CA US |
