| 摘要 |
PURPOSE:To easily form a thin film of various mixtures having regulated compositions, by piling up plural sputtering materials prepared by boring plural holes at equiangular spaces through the concentric-circle materials and also by changing the overlapping degree of the holes. CONSTITUTION:Plural holes 2 are bored at equiangular spaces through a disklike sputtering target 1. The holes 2 are similarly bored through other targets 1 of dissimilar materials. Respective targets 1a, 1b, 1c are piled up to be formed into a composite target, which is disposed in a magnetron sputtering device so as to form a mixture thin film on a substrate 3. At this time, respective target sheets 1a-1c are mutually rotated upon a fulcrum to change the overlapping degree of the holes 2, so that respective sputtering areas of the target sheets 1a-1c are controlled. In this way, the regulation of compositional ratio as well as selection of components of the thin film to be sputtered can easily be carried out. |
